Scientific Committee

  • Muthanna Al-Dahhan, Missouri University of Science and Technology, USA
  • Jiri Drahos, Institute of Chemical Process Fundamentals, Czech Republic
  • Liang-Shih Fan, The Ohio State University, USA
  • Uwe Hampel, Helmholtz-Zentrum Dresden-Rossendorf, Germany
  • Benoit Haut, Université libre de Bruxelles, Belgium
  • Hans Kuipers, Technische Universiteit Eindhoven, The Netherlands
  • Faical Larachi, Université Laval, Canada
  • Jinghai Li, Chinese Academy of Sciences, China
  • Alain Liné, Institut National des Sciences Appliquées de Toulouse, France
  • Arturo Macchi, University of Ottawa, Canada
  • Subhasish Mitra, University of Newcastle, Australia
  • Alissa Park, Columbia University, USA
  • Vivek V. Ranade, Queen’s University Belfast, UK
  • Shantanu Roy, Indian Institute of Technology Delhi, India
  • Jose Teixeira, Universidade do Minho, Portugal
  • Sankaran Sundaresan, Princeton University, USA
  • Madhava Syamlal, National Energy Technology Laboratory, USA
  • Atsushi Tsutsumi, University of Tokyo, Japan
  • Ning Yang, Institute of Process Engineering, CAS, China

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